Degradation of hard MOS devices at low temperature

Generally Applicable Degradation Model for Silicon MOS Devices

Introduction The main cause of operational degradation in MOS devices is believed to be due to the buildup of charge at the Silicon-Oxide interface. This leads to reduced saturation currents and threshold voltage shifts in MOSFET devices. Physics-based models of the degradation process typically consider the breaking of Si-H bonds (depassivation) at the Silicon-Oxide interface to be the main ca...

Speed Performance Degradation of Electrooptic Modulator Devices by Neutrons Irradiations at High temperature Effects

In the present paper, we have deeply investigated the transmission efficiency degradation of electrooptic modulator devices in thermal irradiated hard environments over wide range of the operating parameters. It is well known that the radiation-induced electrooptic modulator defects can modify the initial doping concentrations, creating generation-recombination centres and introducing trapping ...

Lyophilizing Foot-and Mouth Disease Virus at Low Drying Temperature

Green Method for Synthesizing Gallium Nitride Nanostructures at Low Temperature

Gallium nitride (GaN) nanostructures (NS) were synthesized using pulseddirect current plasma enhanced chemical vapor deposition (PDC-PECVD) on quartzsubstrate at low temperature (600°C). Gallium metal (Ga) and nitrogen (N) plasma wereused as precursors. The morphology and structure of the grown GaN NS werecharacterized by field emission scanning electron microscope (FE-SEM), transmissionelectro...

Radiation Hardening of Mos Devices by Boron

OF THE DISCLOSURE A novel technique is disclosed for radiation hardening of MOS devices and specifically for stabilizing the gate threshold potential at room temperature of a radiation subjected MOS field-effect device of the type having a semiconductor substrate, an insulating layer of oxide on the substrate, and a gate electrode disposed on the insulating layer. In the preferred embodiment, t...